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  1. MultiCPM - Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor

    The MULTISEM design concept is based on an open parallel architecture consisting of a central supervisor control unit, and a network of analytical substations
    plasma2
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    interferometry1
    Horiba1
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    Jobin Yvon1
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    etch rate1
    thin film monitors1
    Digitwin0
    plasma characterisation0

    www.multisem.com - 2009-02-13

  2. DIGILEM - Interferometric Endpoint Detector & Thin Film Monitor

    Interferometry is a powerful technique that can be used for endpoint detection of planar layer and trench etching, or deposition
    plasma2
    semiconductor2
    semiconductors2
    deposition2
    etch1
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    endpoint detection1
    thin film measurements1
    deposition rate1
    end point detectors1
    endpointer1
    end pointer1
    end point systems1
    endpoint systems1
    etch rate1
    thin film monitors1
    Digilem0
    etching control0
    semiconductor characterisation0

    www.digilem.com - 2009-02-08

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